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Our upcoming version 7 ("v7") introduces a new level of performance for advanced lithography simulation

  • New, fast, 3D rigorous simulator Maxwell simulator:  TRIG
  • Sub-grid resolution in TEMPESTpr2
  • SEM simulator:  PanSEM
  • SEM image analysis:  PanSIA
  • Source optimization:  PanSO
  • Faster RCWA
  • Faster and more robust 3D FEM modeling of resist shrinkage
  • NTD resist model
  • Stochastic resist models for EUV and DUV
  • and much more