Our upcoming version 7 ("v7") introduces a new level of performance for advanced lithography simulation

• New, fast, 3D rigorous simulator Maxwell simulator:  TRIG
• Sub-grid resolution in TEMPESTpr2
• SEM simulator:  PanSEM
• SEM image analysis:  PanSIA
• Source optimization:  PanSO
• Faster RCWA
• Faster and more robust 3D FEM modeling of resist shrinkage
• NTD resist model
• Stochastic resist models for EUV and DUV
• and much more