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FullChip® Lithography Engineering Software for R&D and Production

  • OPC / Litho Simulation / Verification
  • High Performance Pattern Matcher
  • Layout Database Server / Viewer Client GUI
  • Compact Resist Model (including contour-based calibration)
  • 3D Mask Effects (M3D)
  • Hot Spot Detection / PV-Band Analysis
  • Model-based and Rules-based SRAF placement
  • Retargeting, Dummy Fill, Multiple Patterning Decomposition
  • Presentation and Videos
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