FullChip® Lithography Engineering Software for R&D and Production

• OPC / Litho Simulation / Verification
• High Performance Pattern Matcher
• Layout Database Server / Viewer Client GUI
• Compact Resist Model (including contour-based calibration)
• 3D Mask Effects (M3D)
• Hot Spot Detection / PV-Band Analysis
• Model-based and Rules-based SRAF placement
• Retargeting, Dummy Fill, Multiple Patterning Decomposition
• Presentation and Videos