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The Panoramic Technology software licensing involves two expiry dates:

1.  The Software License Expiry Date

The software will not run beyond the Software License Expiry Date

2.  The Maintenance/Support Expiry Date

The user has access to customer support and any version released before the Maintenance/Support Expiry Date.  After the Maintenance/Support Expiry Date, the user will not have access to customer support, and will not be able to run new versions.  The software will continue to run as long as the Software License Expiry Date has not passed.

When the software is purchased, the items on the quote/invoice are divided into two categories:

1.  Software items

These items refer to the actual computer programs/options that are being purchased.  (only the binary executable is purchased, not the source code)

2.  1-Yr License/Maintenance/Support (LMS) items

These items refer to the license to run the programs, and to the right to have access to customer support and upgrades.  Specifically, it is the extension of the Software License Expiry Date and the Maintenance/Support Expiry Date by one year.  The LMS items must be purchased at the time the software purchased.

In summary: Initially the Software and LMS items must be purchased.  This will allow the user to run the software for the first year.  At the end of the first year and every subsequent year the LMS items must be purchased in order to continue to run the software.  The Software License Expiry Date and the Maintenance/Support Expiry Date are incremented by 1 year when the LMS is purchased.

Indefinite License Extension

Users can, at any time, purchase an Indefinite License Extension.  This is effectively a "perpetual license".  Specifically, the Software License Expiry Date is set to the date Jan 1, 2999.  There is no discount given when the LMS is purchased after the Indefinite License Extension has been purchased. (i.e. the Software License Expiry Date remains Jan 1, 2999 and the Maintenance/Support Expiry Date is extended by one year)

Note: Even with the purchase of the Indefinite License Extension the LMS must be purchased for the first year.

Note:  The Indefinite License Extension does not apply when leasing (see below).  It only applies when the software has been purchased.

Leasing with Option to Purchase

The software may be leased on a yearly basis.  In this case, instead of purchasing the Software up-front, one pays a leasing fee.  The LMS must be purchased along with the yearly lease.  80% of leasing fees will be applied to the purchase price of the software when the software is purchased within 3 years of the date the leasing fees were paid.

Note:  One can not switch to the leasing option after the software has been purchased.

License Sharing

The software may be installed on multiple machines, and the USB "dongle" (the security key) can be passed from machine to machine (thus sharing the license).  Also see thKeyServer™ (Network License)

KeyServer™ (Network License)

The KeyServer™ product allows the security key to be put on a "server" computer and the license can be served to one or more "client" computers.  The EM-Suite/HyperLith programs are run on the local, "client" computer, but the license is "served" from the "server" computer. An EM-Suite/HyperLith™ license must be purchased for each "seat" to be served.

For example, if a research group in a company has licenses for 5 HyperLith™ "seats" then up to 5 users can simultaneously run HyperLith™.

KeyServer™ is sold as a separate option and can be purchased at any time.

The "server" machine running KeyServer™ must have a USB "dongle" (security key) attached.  The "client" computers do not need security keys.

It is possible to use a combination of hand-passed security keys and a network license server.  This allows some licenses to be operated without network connectivity (i.e. a user wants to run on his/her laptop at home or while traveling).

KeyServer™ currently only serves EM-Suite
, HyperLith and SOAPI program.  It does not serve a license for SimRunner, however SimRunner can be run on the same machine that KeyServer™ runs on and users on "client" machines can submit batches to the SimRunner™ remotely.

Currently each "seat" served by the KeyServer™ must have the same set of options.  For example, if a server is serving 5 seats, all seats have access to the same set of options such as Resist, TEMPESTpr2 and Gazillion.  This means that 5 licenses of Resist, TEMPEST, and Gazillion must be owned.

For more information about KeyServer™ please contact Panoramic Technology.


Panoramic Technology Inc., founded in 1999, develops and globally markets simulation software for advanced semiconductor lithography.  The company has a proven track record of leadership and continues to be a leader in the lithography simulation community within the semiconductor industry.

The company's products allow lithographers to simulate the semiconductor lithography process, modeling the mask, the exposure tool and the resist at the wafer.  The company's customers include large and small semiconductor manufacturers, equipment vendors, research institutes, start-ups and universities

Panoramic Technology prides itself in offering the best lithography research simulation software at the best price and in offering extremely responsive customer service.

Key Benefits

  • Poweful and flexible 3D rigorous EMF Solver (FDTD and RCWA and TRIG) for mask/wafer/general geometries
  • The most advanced EUV modeling (including anamorphic imaging)
  • Source optimization with rigorous mask model
  • Correct FEM modeling of resist shrinkage (due to SEM exposure and PEB for NTD resists)
  • Extensive distributed/cluster/network computing capabilities
  • Comprehensive data visualization and post-processing capabilities
  • Powerful batching capabilities
  • Phython/MATLAB/Octave/Java API
  • GDS-II layout integration (with editor and advanced operations)
  • Small-area OPC (rigorous and scalar model-based)
  • Windows and Linux support
  • Hardware accelerated FDTD (NVIDIA GPU)
  • Easy-to-use interface HyperLith(TM)
  • Price!  Yes!  A better simulator for less!  (read How & Why?)

Panoramic's proven track record of leadership

When compared to our nearest two competitors, Panoramic has a long history of being the first to offer many important features.

  • 1999: First to offer commercial rigorous FDTD EM-Solver (years before our competitors)
  • 1999: First to offer full vector imaging (years before our competitors)
  • 1999: First to offer rigorous simulator for EUV masks (almost 9 years ahead of one of our competitors)
  • 1999: First to offer rigorous simulator for mask/wafer inspection
  • 2000: First to offer ability to simulate non-constant scattering coefficients
  • 2000: Introduction of very powerful batching capabilities (using formulas and variables)
  • 2001: First to offer parallel computing (SimRunner)
  • 2003: First 64-bit Linux
  • 2003: First to offer full-featured GDS-II layout viewer/editor.
  • 2003: First research simulator to offer rigorous-mask model-based small-area OPC
  • 2004: First to handle immersion & polarization properly
  • 2007: First commercially available truly-distributed FDTD and Abbe imaging code for lithography
  • 2007: First hardware-accelerated FDTD code for lithography
  • 2008: First hardware-accelerated 3D resist model
  • 2008: First 64-bit Windows lithography simulator
  • 2009: HyperLith!  The first easy-to-use, powerful yet reasonably-priced simulator!
  • 2010: First to allow user-written resist models
  • 2010: First to correctly model resist shrinkage effects ("strange distortion", footing, corner rounding bias)
  • 2010: First to offer 64-bit 3D RCWA
  • 2014: First to offer anamorphic imaging (for EUV)
  • 2014: TRIG fastest rigorous EUV simulator

Further Reading

The goal of this page is not to demonstrate the raw speed of the simulator, but rather to demonstrate the speed-up that can be obtained by using multiple cores, processors, GPU's in different ways. You can run these simulations on your own machine (they are based off the examples that ship with the software) and see how your hardware compares to the machines we've tested.




PSS/HSS configuration

PSS/HSS license requirement

Effective Cycle Time (s/cycle)*



Elbow.sim, 3GB, 3D EUV with Fourier Boundary Condition, non-complex

Box #1: 2x Opteron 285, 16GB DDR400

1x 1-threaded-PSS



Single-core (i.e. no SimRunner)




1x 4-threaded-PSS



4 cores give 2X speedup with multi-threading (4 cores working on one job)




2x 1-threaded-PSS



2 cores give almost 2X speedup with job-distribution (2 cores working on two jobs independently).  This is always more efficient than multi-threading, but requires more memory.




2x 2-threaded-PSS



combination of multi-threading and job distribution seems optimal - 4 cores giving 3X speedup - requires memory for two simulations.  Seems reasonable on AMD dual-core architecture where each processor (pair of cores) has it's own memory controller and "close" memory.




1x SuperPSS

 -{4x 1-threaded PSS}



almost 3X speedup with 4 cores, but uses less memory than #A4.  Much faster than #A2.



Box #1: 2x Opteron 280, 16GB DDR 400

Box #2, 2x Opteron 270, 16GB DDR 400

1x SuperPSS

-{8x 1-threaded PSS}



Not much faster than #A4 or #A5.  Uses less memory per machine than #A4.




2x SuperPSS{2x 2-threaded-PSS}



The Opteron 270 machine is slower.  If both machines were opteron 285's than we would expect double the performance of #A4.



Box #1: 2x Tesla C870

1x 2-GPU-HSS



Simulation fits entirely within two cards.



Box #1: 1x Tesla C870

1x 1-GPU_HSS



More than 2X faster than #A4. (1 HSS license vs. 4 PSS licenses)



Box #1: 2x Tesla C870

Box #2: 2x Tesla C870

2x 2-GPU-HSS



Double the performance of #A8 (running two cases at once)




1x SuperPSS{2x 2-GPU-HSS}



Bad performance because of communication overhead for SuperPSS.


AltPSM_Contacts with pitch=2.2 (9.1GB)

Box #1: 2x Opteron 285, 16GB DDR366, 2x C870

1x 1-GPU_HSS



The DDR 400 memory was slowed to 366MHz.


Box #2: 2xIntel 5440 32GB, DDR2 667, 1X C870

1x 1-GPU_HSS



This machine has faster memory compared with B1.


2x SuperPSS{4x 1-threaded-PSS}



Using all 8 cores is slower than 1x Tesla C870 on the same machine. (see B2)


Box #1: 2x Opteron 285, 16GB DDR366, 2x C870

1x 2-GPU_HSS



Using 2 C870's compared to 1 C870 gives 101s to 162s. So, don't get a 2X speedup (as expected) – but do get a decent speed-up (162/101=1.6X speedup)


Box #2: 2xIntel 5440 32GB, DDR2 667, 1X C870

1x 8-threaded PSS



See B3.


2x SuperPSS{2x 2-threaded-PSS}



See B5 & B3.


1x SuperPSS{1x 8-threaded-PSS, 1x 1-GPU_HSS}



Better to just use HSS alone. The PSS's can't help it – just slow it down. See B2.


AltPSM_Contacts, pitch=0.3 (169MB)

Box #2: 2xIntel 5440 32GB, DDR2 667, 1X 8800 GT-OC

1x 1-GPU_HSS



This is just a graphics card (8800 GT-OC) with 512MB GDDR3 memory. The card was driving video during the simulation (maybe a bit faster without video)


Box #2: 2xIntel 5440 32GB, DDR2 667, 1X C870



Compare to C1. The TESLA C870 beats the less expensive 8800 GT-OC even for small simulation that fits entirely with the card's memory.


Box #2: 2xIntel 5440 32GB, DDR2 667

1x 1-threaded-PSS



Tesla C870 is 7.67X faster than single core of Intel 5440. 8800 GT-OC is only 6.3X faster


Box #1: 2x Opteron 285, 16GB DDR366, 2x C870



Older Opteron 285 same speed as newer Intel 5440!?


1x 1-GPU_HSS



Tesla C870 on Opteron 285 with 366MHz DDR is slower than Tesla C870 on Intel 5440 with DDR2 667MHz. (expected)


AltPSM_Contacts, pitch=0.8 (1.2GB)

Box #1: 2x Opteron 285, 16GB DDR366, 2x C870

1x 1-GPU_HSS



Simulation fits entirely within the Tesla C870's 1.5GB memory.


1x 1-threaded-PSS



Compare to D1. Here the Tesla C870 is 14X faster than the Opteron 285 Processor. This is the “sweet spot” for the C870 because the simulation is large, but still fits inside the card.


Box #2: 2xIntel 5440 32GB, DDR2 667



Here we see the newer Intel 5440/DDR2 667MHz beating the older Opteron 285/DDR 366MHz (expected)


Box #2: 2xIntel 5440 32GB, DDR2 667, 1x C870

1x 1-GPU_HSS



Here we we 9.5X speed-up when compared to late model Intel 5440 processor. Note, this cycle time is faster than C870 on the older Opteron machine (D1). So, host system does matter.

AltPSM_Contacts, pitch=0.3 (169MB)
Box #1: 2x Opteron 285, 16GB DDR366, 2x C870 1x 1-GPU_HSS
compare with E1a
" (but with 2XC1060)
compare with E1 - the C1060 has 2X the processing power as the C870
" (but with 2X C870)
1x 2-GPU_HSS
as expected no improving when using more cards on a small simulation that fits within one card (compare to E1)
" (but with 2X C1060)
basically same as E1a
" (but with 2X C870)
2x 1-GPU_HSS
running two simulations at the same time - compare to E1
" (but with 2X C1060) "
" - compare to E1a
Elbow.sim, 3GB, 3D EUV with Fourier Boundary Condition, non-complex " (but with 2X C870) 2x 1-GPU_HSS
Compare with E4a
" (but with 2X C1060) "
C1060 more than 2X faster than C870 - compare with E4
" (but with 2X C870) 1x 2-GPU_HSS
Compare with E5a
" (but with 2X C1060) "
Not so great improvement of C870 is expected because 2nd card is not utilized at all as simulation fits within the first card.  In E5, both C870's are running at same time, in here (E5a) only one card is running while the other sits idle.
Elbow.sim, with 6 degree incidence (complex simulation) and pitch=76nm, 10GB, 3D EUV with Fourier Boundary Condition
" (but with 2X C870) 1x 2-GPU_HSS
domain divided into 7 parts - the first 6 parts run in simultaneous pairs, and the 7th part runs on one card while the other remains idle - card utilization is 7/8=87.5% (excluding CPU memory xfer overhead)
" (but with 2X C1060) "
domain divided into 3 parts - the first 2 parts run simultaneously, and the 3rd parts runs on one card while the other remains idle - card utilization is 3/4=75% (excluding CPU memory xfer overhead)  The reason there is not 2X speedup over E6 is because GPU utilization is lower, and CPU xfer overhead might be large - especially since box has DDR 336 (not even DDR2) and only PCI x16 generation 1 (not generation 2.0).  Probably with PCI Express x16 (gen 2) and DDR2 - 800, improvement will be closer to 2X.

*Note:  "Effective" cycle time is the total cycle time divided by the number of cases running.  For example, if you have 5 PSS's running 5 different simulations (of the same size) and each has a cycle time of 10s, then the effective cycle time would be 10s/5=2s.  A "cycle" is amount of time TEMPESTpr2 takes to propagate the fields one wavelength.

Panoramic Technology Inc. has the following positions open:

Photoresist Modeling/Applications Engineer


  • Photoresist modeling experience required.
  • Lithography simulation experience required.
  • Candidate should have puplished papers in the field of resist simulation and modeling at conferences such as SPIE Advanced Lithography and SPIE Photomask.

Position will involve

  • developing photoresist models
  • tuning resist parameter sets
  • working with customers on photoresist modeling and litho simulation in general
  • photoresist and lithography simulation research


  • extremely exciting small-company atmosphere
  • ability to work from your home (even if you live in Texas for example!)
  • or, working in Berkeley, CA
  • benefits:  retirement plan, health insurance
  • salary will be comptitive - with significant bonus potential

At Panoramic Technology we have been continuously improving our lithography simulation software for over ten years.  We're always at the forefront of the technology, being first to implement new features before our competitors (EUV, polarization issues in immersion, distributed computing, wafer topography etc.)

We continue to maintain our vigorous pace of development and we continue to raise the bar for lithography research simulators.

Near Term Plans

  • Advanced Resist Modeling Infrastructure (ARMI) - gives the user the ability to do advanced resist model development "in-house".
    • PanTune - a general purpose "tuner" that can be used for resist model parameter calibration.
    • User-Written Resist Models (UWRM) - user can program their own custom resist models and insert them into the EM-Suite/HyperLith simulation infrastructure - as a direct peer to the existing resist models.
  • Continued resist modeling research - we are working with several customers on tuning resist parameter sets, and solving modeling issues with EUV and DUV resists.
  • Extend SOAPI (our MATLAB(TM)/Java(TM) API) to HyperLith
  • Improve Gazillion and PanOPC integration into HyperLith
  • Application notes, examples, training-videos, documentation
  • Wafer-topography/Double-Patterning research, modeling, GUI improvements
  • Develop "quasi-rigorous" mask models for EUV

Long Term Plans

  • Maintain the lead in power and flexibility
  • Incorporate new features as the technology advances
  • Continuously improve speed, and ability to simulate larger areas
  • Larger area (but not full-chip) OPC correction that is better suited to manufacturing
  • Continuous GUI improvements - ease-of-use-without-sacrificing-power-and-flexibility always a priority
  • Source-Mask-Optimization & Inverse Algorithms

Ultimately, we plan to become the dominant lithography "research" simulator.  We feel this will happen because we deliver the most powerful, most flexible lithography simulator at a price that can not be matched by our competitors.  (see How and Why Can Panoramic Technology Offer the Best Lithography Research Simulator for Such an Amazing Low Price?)



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