FullChip® Lithography Engineering Software for R&D and Production
- OPC / Litho Simulation / Verification
- High Performance Pattern Matcher
- Layout Database Server / Viewer Client GUI
- Compact Resist Model (including contour-based calibration)
- 3D Mask Effects (M3D)
- Hot Spot Detection / PV-Band Analysis
- Model-based and Rules-based SRAF placement
- Retargeting, Dummy Fill, Multiple Patterning Decomposition
- Presentation and Videos
TRIG is a new fast, rigorous, accurate, 3D Maxwell solver for EUV and DUV
- Particularly fast for rigorous EUV (20X faster than FDTD+FBC)
- Faster for DUV (~2X to 5X)
- See presentation on TRIG for EUV
- See presentation on TRIG for DUV
- See detailed performance benchmark (DUV)
- See 50X speed-up for rigorous EUV video
Our upcoming version 7 ("v7") introduces a new level of performance for advanced lithography simulation
- New, fast, 3D rigorous simulator Maxwell simulator: TRIG
- Sub-grid resolution in TEMPESTpr2
- SEM simulator: PanSEM
- SEM image analysis: PanSIA
- Source optimization: PanSO
- Faster RCWA
- Faster and more robust 3D FEM modeling of resist shrinkage
- NTD resist model
- Stochastic resist models for EUV and DUV
- and much more
- Negative Tone Develop (NTD) Resist Model
- Included with Resist option
- 3D FEM modeling of deprotection shrinkage
- See video!
- See presentation!
- Simulate SEM image formation
- Physics-based model
- Including SEM-induced shrinkage
- Calibrate resist models by comparing simulated SEM CD to experimentally measured SEM CD (an "apples to apples" comparison)
- Includes PanSIA
- See video!
- See presentation!
Panoramic Technology Inc. is pleased to announce availability of HyperLith - an easy to use, lithography simulator
- Easy-to-use and Powerful
- Supports scalar and rigorous, EUV and DUV technologies
- Hardware Acceleration, Parallel Processing, Distributed Computing
- Windows & Linux
- Click here for a demo video and more details
