FullChip®

  • OPC
    • Manhattan
      • Rules-based
      • Model-based
    • Curvi-linear (FrogToe)
  • Design Verification
    • Edge-placement error (EPE)
    • Process-Variation Bands (PV-Bands)
    • Hot-spot detection'
    • bridging and necking detection
    • via overlap analysis
  • SRAF Placement
    • Rules-based
    • Model-bsed
  • DRC/MRC
  • Mask Re-targeting
  • EUV/DUV
  • M3D
    • Mask "3D Effects" model for more accuracy
    • Constant Scattering Coefficients (CSC)
    • Non-constant Scattering Coefficients (NCSC)
  • Pattern Matching Technology
  • Layout Server/Client Viewer Architecture
    • multiple users simultaneously accessing/processing same layout
    • centralized layout storage
  • Fast litho models for large-area/full-chip processing
  • Distributed Computing with SimRunner