EUVL Modeling With Panoramic Technology
Panoramic Technology has been the leader in EUVL modeling since 1999. Both HyperLith and EM-Suite are capabile of simulating many aspects of EUVL.
- embedded multilayer mirror defects (download a recent presentation)
- defect printability (download a recent presentation)
- off-axis effects, shadowing, H-V bias
- absorber stack effects
- absorber pattern effects
- absorber pattern defects
- multilayer mirror structure
- defect inspectability (at DUV and EUV wavelengths) (download a recent presentation)
Several Important Features Make Panoramic the Most Powerful
- Fourier Boundary Condition
- Ultra-large FDTD simulation domains (>2 billion cells, >100GB memory)
- Distributed Computing
- Hardware Acceleration
- EUV Defect Generator
- Calibrated EUV Resist Models
- Advanced Resist Modeling Infrastructure (ARMI) for developing new EUV resist models (including stochasitic models)
- Experience & Support
What Panoramic Technology Offers
- Simulation Software (EM-Suite, HyperLith, TEMPESTpr2, SimRunner/PSS/HSS, Resist, ARMI, SOAPI)
- Consulting Services
- Combination of Consulting and Software