• Perfect for Double Patterning Simulations
  • Immersion bubble, reflective notching, non-planar resist surface, underlying structures
  • Calculate image-in-resist in the presence of topography rigorously with TEMPESTpr2
  • Hardware Acceleration and Parallel Processing
  • Powerful 3D geometry editor lets user define and visualize the wafer geometry
  • See the demo video

PanOPC applied to an Iso-Dense Elbow Pattern



CD Through Pitch for Three Illuminations